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Corning Scientists Win Patent for New Silica Glass Material

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Corning Incorporated announces two of its scientists received a patent for a glass that enables the transmission of wavelengths at 157nm. The silica glass will be used to create photomasks for microlithography applications. A photomask is a transparent optic used in microlithography that contains the information written on integrated circuits. Dr. Lisa Moore and Dr. Charlene Smith, both scientists within Corning's Semiconductor Materials Division, modified the composition of silica by removing the water and adding fluorine ions. The resulting glass enables the transmission of wavelengths...Read full article

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    Published: August 2001
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