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DuPont Photomasks Reports First X Architecture Mask

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SUNNYVALE, Calif., Oct. 9 -- The X Initiative, a semiconductor supply chain consortium, announced the results of a successful effort by charter members DuPont Photomasks Inc. and Simplex Solutions Inc. to produce the first X architecture photomask. DuPont Photomasks used existing photomask production equipment to successfully write and inspect an X architecture test mask, based on simplex-generated design data. DuPont Photomasks determined all test results fall within the range of normal as compared to traditional designs. The rapid success of this early mask experiment has broad implications...Read full article

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    Published: October 2001
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