Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

  • DuPont Photomasks Expands European Facility
Dec 2001
ROUND ROCK, Texas, Dec. 7 -- DuPont Photomasks Inc. said it is expanding its facility in Corbeil-Essonnes, France, to include a state-of-the-art, 7000-square-foot cleanroom. The newly constructed cleanroom is designed to support the future production of advanced photomasks below 70-nanometer design rules.

The Corbeil facility is currently being upgraded to include advanced binary and phase-shift mask production capabilities, supporting 130-nanometer design rules, as well as dry-etch capabilities. Employing DuPont Photomasks' mix-and-match approach, the facility features both laser and electron-beam pattern generators, ensuring that each layer is produced as quickly and cost-effectively as possible.

Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2016 Photonics Media
x We deliver – right to your inbox. Subscribe FREE to our newsletters.