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DuPont Photomasks Expands European Facility

Photonics.com
Dec 2001
ROUND ROCK, Texas, Dec. 7 -- DuPont Photomasks Inc. said it is expanding its facility in Corbeil-Essonnes, France, to include a state-of-the-art, 7000-square-foot cleanroom. The newly constructed cleanroom is designed to support the future production of advanced photomasks below 70-nanometer design rules.

The Corbeil facility is currently being upgraded to include advanced binary and phase-shift mask production capabilities, supporting 130-nanometer design rules, as well as dry-etch capabilities. Employing DuPont Photomasks' mix-and-match approach, the facility features both laser and electron-beam pattern generators, ensuring that each layer is produced as quickly and cost-effectively as possible.



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