ROUND ROCK, Texas, Feb. 7 -- DuPont Photomasks Inc. plans to significantly upgrade the capability of DuPont Photomasks Co. Ltd., its joint-venture photomask manufacturing facility in Shanghai, China. The facility, located at the CaoHeJing Hi-Tech Park, is being upgraded to better serve the growing semiconductor market in China. DuPont Photomasks said the move will make it the first merchant photomask producer in China to install an advanced manufacturing line capable of producing photomasks supporting semiconductor design rules of 180 nm. The line will be anchored by an Etec Systems (an...Read full articleRelated content from Photonics MediaArticlesHigh-Speed Nanomachining Imparts Nanostructures’ Finest FeaturesThe need to increase component density, as well as add performance, are long-standing drivers behind the development of nanofabrication technology. 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