ASML, a Netherlands-based provider of advanced technology systems for the semiconductor industry, said it has received the industry's first order for an extreme ultraviolet (EUV) lithography beta tool from Intel Corp. The EUV beta tool will use 300 mm wafers and is initially targeted for 45-nm-resolution capability. Delivery is slated for the second half of 2005. . . . Richard S. Danforth has joined DRS Technologies Inc. as executive vice president, operations, of its Electronic Systems Group.
MORE FROM PHOTONICS MEDIA