SAN DIEGO, June 3 -- JMAR Technologies Inc., developer and supplier of proximity x-ray lithography systems and light sources, said its JMAR/SAL NanoLithography Inc. (JSAL) division, in Burlington, Vt., has received a contract from the Naval Air Warfare Center in Patuxent River, Md., for up to $10 million for sub-100 nanometer geometry next-generation lithography masks to produce advanced semiconductors. The contract, funded by the Defense Advanced Research Projects Agency (DARPA), is a two-year effort that will produce x-ray masks used in the development and production of high-performance...Read full articleRelated content from Photonics MediaArticlesSCHNEIDER Partners with Micro-LAM; Laser Light Companies Receive $100M in Debt Financing: Week in Brief: 11/17/23US Capital Global has entered into a term sheet to provide credit facilities totaling a minimum of $100 million to Laser Light Companies, a global networking platform designer and builder. 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