SAN DIEGO, Oct. 1 -- JMAR Technologies Inc., a developer of collimated laser plasma lithography systems, announced it received $7.7 million in funding to demonstrate its integrated NanoPulsar semiconductor lithography stepper system and its evaluation by GaAs end users. This program is sponsored by the Defense Advanced Research Projects Agency (DARPA). The new funding is part of an incremental $34.5 million award JMAR received from the U.S. Army in February. Under the new contract, JMAR will increase the processing throughput of its CPL system by increasing the laser source power output,...Read full articleRelated content from Photonics MediaArticlesFiber Lasers Scale Up Output Powers and End MarketsHigh-power fiber lasers are a versatile and powerful tool for a wide range of industrial applications, from cutting and welding to defense and beyond. 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