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JMAR Restructures Operations

Photonics.com
Feb 2003
SAN DIEGO, Calif., Feb. 14 -- JMAR Technologies Inc., a developer of advanced lasers, Collimated Plasma Lithography (CPL) systems, semiconductor production and design services and precision microelectronics equipment, announced it will restructure and streamline its operations in order to improve profitability and better support the commercialization of its emerging CPL semiconductor manufacturing systems and related technologies.

Under the restructuring, the company will sell its JMAR Precision Systems Inc. (JPSI) motion and metrology equipment manufacturing operation in Chatsworth, Calif., and form its JMAR Research, JMAR/SAL NanoLithography, and JMAR Semiconductor operations into a single corporate entity with three specialized divisions:

The Research Div. (formerly JMAR Research, in San Diego) will continue to develop laser and laser-produced plasma technologies for the company's CPL Source, EUV generators and related products such as high-brightness lasers.

The Systems Div. (formerly JMAR/SAL NanoLithography, in Burlington, Vt.)will develop not only X-ray lithography steppers, but also the product engineering, production and integration of CPL light sources and CPL stepper systems.

The Microelectronics Div. (formerly JMAR Semiconductor, in Sacramento, Calif.) discontinued the standard products business of JSI and transferred the assets of its Sacramento operations to JSI Microelectronics, now the Microelectronics Div. This division will continue to provide process integration and maintenance support for the Defense Microelectronics Activity's semiconductor fabrication facility in Sacramento and ASIC design and production capability for the military and commercial markets.

JMAR Technologies President and CEO Ronald A. Walrod said, "We anticipate completing this general restructuring over the next two to three months. The very positive results we continue to see from our continuing CPL source tests are highly encouraging, and we look forward to soon being able to demonstrate to industry the inherent simplicity of sub-100 nm, nonoptical, proximity X-ray lithography using our JMAR CPL Stepper system."

For more information, visit: www.jmar.com



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