SAN DIEGO & SANTA CLARA, Calif., Jan. 26 -- Intel Corp. announced today an agreement to provide $20 million in funding to Cymer Inc., a supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, over the next three years to accelerate development of production-worthy extreme ultraviolet (EUV) lithography light sources. The companies said a key issue confronting the commercialization efforts of EUV lithography is the ability to increase source output power to meet the wafer throughput requirements of high-volume manufacturing, while minimizing the cost of owning EUV...Read full articleRelated content from Photonics MediaArticlesLarge-Aperture Metalens Images Lunar SurfaceResearchers at Penn State developed a metalens that is large enough to be put into a telescope, and then they used the optic to image the moon's surface. 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