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Molecular Imprints Inc. (MII) an Austin, Texas, manufacturer of step and flash imprint lithography technology, has completed an exclusive licensing agreement with the Massachusetts Institute of Technology (MIT) to use the university's moire fringe alignment technology in MII's nano imprint lithography tools. MII said it will use the technology for high-resolution alignment in advanced lithography applications. MII has demonstrated 7-nm 3-sigma alignment with this technique on an MII tool. MIT professor Hank Smith led the effort to develop this technology and will be part of the ongoing...Read full article

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    Published: December 2004
    industrialMassachusetts Institute of TechnologyMITMolecular ImprintsNational InstrumentsNews BriefsPhotonics Tech BriefsUniversity of Texas at Austin

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