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e|5 to Showcase UV, EB Technologies

Photonics.com
Mar 2006
CHEVY CHASE, Md., March 17, 2006 -- Wearable displays, radio frequency identification (RFID), military textiles, inkjet for printed electronics, and biological and chemical hazard detection and suppression for body armor will be among topics presented at the e|5 2006 ultraviolet (UV) and electron beam (EB) technology exposition and conference, to be held April 24-26 at McCormick Place in Chicago.
"From fiber optics fabrication to super fast, environmentally friendly printing technologies, Chicago area companies are at the forefront of developing -- and using -- technologies to help US business become and stay more competitive," said the event's sponsor, RadTech, an association for UV and EB processes. "By replacing energy-draining and inefficient traditional methods of curing materials with innovative, safe EB and UV sources, manufactures are becoming more competitive and helping the environment. While electron beams and ultraviolet photons may sound futurisitic, area corporate giants and local firms in industries such as aerospace/defense, printing and packaging, wood, plastics, metal, homeland security, nanotechnology, LEDs and electronics, along with hundreds of other area businesses, are developing and refining these methods to not only improve corporate efficiency, but to make new products," the association said.
More than 3000 technologists and manufactures from 30 nations are expected to attend e|5 2006.
The application of nanotechnology and of LEDs to UV and EB will also be discussed, and a full day will be devoted to technical developments from Japan (presented in simultaneous translation). In addition, a variety of UV- and EB-enabled products will be on display by more than 100 exhibitors.
For more information, visit: www.e52006.com


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