Part of the SPIE Field Guide series, the 134-page Field Guide to Optical Lithography provides an overview of the process, including substrate preparation, photoresist spin coating and postapply and postexposure bake. The spiral-bound volume’s section on image formation includes diffraction, Maxwell’s equations, Fourier optics, and spatial coherence and oblique illumination. It provides discussions on imaging into a photoresist, which encompass standing waves, Fresnel reflectivity, swing curves, and top and bottom antireflection coatings. Photoresist chemistry, such as absorption of light and exposure kinetics, along with lithography control and optimization, including the normalized image log-slope, also are addressed. An equation summary, a glossary and an index are provided. Chris A. Mack; SPIE Press, Bellingham, Wash., 2006; $29, SPIE members, $34, nonmembers.