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ASML Selects Cymer for EUV Light Source

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In the August story on laser-derived extreme-ultraviolet (EUV) photon sources, a spokesman for semiconductor scanner maker ASML Netherlands BV in Veldhoven said that the company would someday consider a laser-driven source. This idea has become a reality: ASML and San Diego-based Cymer Inc. have announced a multiyear, multiunit laser-produced plasma EUV source agreement, with the first shipment scheduled for 2008. Cymer is a supplier of deep-UV lasers used in semiconductor scanners, and the company several years ago proposed that lasers may be the best source for 13.5-nm EUV photons....Read full article

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    Published: September 2007
    Businessindustriallaser-derived extreme-ultraviolet (EUV) photon sourceslight speed

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