The 700-page volume EUV Lithography provides comprehensive information on extreme-ultraviolet (EUV) lithography for practitioners and for those needing an introduction to the field. Written by experts in the technology, the resource addresses EUV optics, source technology, wavefront measurement techniques for optical testing, mask and mask metrology, resist technology and system patterning performance. The topic of contamination and its control in EUV lithography scanners also is discussed. Vivek Bakshi, ed.; SPIE Press, Bellingham, Wash.; John Wiley & Sons Inc., Hoboken, N.J., 2009; $89 SPIE members; $105 nonmembers.