Vistec Electron Beam GmbH of Jena, Germany, has announced its entrance into a joint electron beam lithography project with Moscow Institute of Electronic Technology (MIET). The two will collaborate on a photomask manufacturing project that began recently in Russia. The electron beam lithography provider will supply the institute with a 50-kV variable-shaped beam system, which is equipped with fully automated substrate handling and can expose different substrate types and sizes. MIET will provide the masks to the semiconductor industry and research institutes in Russia for a variety of applications.