Genesis Photonics Orders Multiple Veeco MOCVD Systems
PLAINVIEW, N.Y., April 28, 2010 — Veeco Instruments Inc. has received orders for multiple TurboDisc K465i gallium nitride (GaN) metal organic chemical vapor deposition (MOCVD) systems from Genesis Photonics Inc. (GPI) of Taiwan.
The systems will be utilized to increase capacity for the production of high-brightness light emitting diodes (HB LED) being driven by applications, including backlighting, lighting, displays and automotives.
With some of the former company’s systems already installed in its manufacturing facility, GPI has selected the K465i system for increasing its capacity demands. The system is anticipated to help it surpass its LED brightness roadmap objectives, said the company.
The system offers ease-of-tuning for fast process optimization on wafer sizes up to 8 in. and fast tool recovery time after maintenance.
The former company manufactures enabling services for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets.
GPI is a provider of GaN-based LED epi-wafers and LED chips for scientific, industrial and research applications.
For more information, visit: www.veeco.com
- The forming of a clear silhouette of an object by placing a light source behind it. Used in machine vision when surface features of an object are not important.
- A combination of components arranged so as to perform at least one function.
- A cross-sectional slice cut from an ingot of either single-crystal, fused, polycrystalline or amorphous material that has refined surfaces either lapped or polished. Wafers are used either as substrates for electronic device manufacturing or as optics. Typically, they are made of silicon, quartz, gallium arsenide or indium phosphide.
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