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ASML Aims to Extend Optical Lithography to 157 nm

Photonics.com
Jul 1999
VELDHOVEN, The Netherlands, July 7 -- ASM Lithography (ASML) has unveiled a 157 nm technology development program aimed at extending imaging capabilities beyond 193 nm. The program's goal is to deliver production systems by 2003 through the facilitation of research activities among ASML's strategic technology partners, including Carl Zeiss.
Developing a 'whole product' solution for 157 nm lithography will require a focused, industry-wide effort, said Bill Arnold, ASML's executive scientist. This undertaking, whose impact will be felt throughout the global semiconductor business, is beyond the resources of any single company. ASML, our strategic optics partner Carl Zeiss, optic materials supplier Schott, and laser suppliers Cymer and Lambda Physik are committed to meeting the technical challenges.


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