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Lithography System Order

Photonics Spectra
Aug 2010
Pennsylvania State University of University Park has ordered Vistec Lithography Inc.’s EBPG5200 electron-beam lithography system for the National Science Foundation’s National Nanotechnology Infrastructure Network so as to support advanced nanotechnology research nationwide. The system will be installed at the university’s new Millennium Science Complex. Vistec, of Watervliet, N.Y., is a provider of electron-beam lithography equipment based on shaped-beam technology.

The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
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