CARDIFF, England, Nov. 9, 2010 — New research in optical measurement technologies enabling applications in industry, research modeling, inspection of nanostructures and artwork, and related topics will be presented at SPIE Optical Metrology 24 to 26 May 2011.
The conference will be held at the International Conference Centre Munich in conjunction with Laser World of Photonics.
SPIE Optical Metrology is the field’s premier conference in Europe for scientists, engineers, researchers, and applications or product developers, noted symposium chairs Wolfgang Osten, Universiteit Stuttgart; Malgorzata Kujawinska, Warsaw University of Technology; and Pietro Ferraro, Istituto Nazionale di Ottica Applicata.
Abstracts may be submitted through Nov. 15 for four conferences:
- “Optical Measurement Systems for Industrial Inspection,” chaired by Peter Lehmann, Universiteit Kassel, on optical metrology methods and their applications in solving measurement problems in industrial design and production engineering.
- “Modeling Aspects in Optical Metrology,” chaired by Bernd Bodermann, Physikalisch-Technische Bundesanstalt, on optical metrology modelling as a prerequisite for traceable and comparable measurements.
- “Optics for Arts, Architecture and Archaeology,” chaired by Luca Pezzati, Istituto Nazionale di Ottica Applicata, and Reno Salimbeni, Istituto di Fisica Applicata Nello Carrara, on advanced optical methodologies for the study, documentation, safeguard, preservation and conservation of cultural heritage.
- “Videometrics, Range Imaging and Applications,” chaired by Fabio Remondino, Fondazione Bruno Kessler and Mark Shortis, RMIT University, on advances in precise 3-D measurement and accurate modeling from imaging and range sensors.
The conference website contains call for papers and submission information.
Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections. The SPIE Digital Library is the world’s largest collection of optics and photonics literature and a leading resource for scientific and patent research.
Along with SPIE Optical Metrology, the biennial World of Photonics Congress includes conferences organized by WLT (German Scientific Laser Society/Wissenschaftliche Gesellschaft Lasertechnik), EOS (European Optical Society), OSA, IEEE Photonics Society and EPS (European Physical Society).
For more information, visit: www.spie.org