Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
SPECIAL ANNOUNCEMENT
2016 Photonics Buyers' Guide Clearance! – Use Coupon Code FC16 to save 60%!
share
Email Facebook Twitter Google+ LinkedIn Comments

Zygo Wins $9M Contract for EUV Tool Optics

Photonics.com
Oct 2011
MIDDLEFIELD, Conn., and ALBANY, N.Y., Oct. 27, 2011 — Optical metrology supplier Zygo Corp.’s Optical Systems Div. has been awarded a $9 million contract with the College of Nanoscale Science and Engineering (CNSE) at the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics. The optics will be incorporated in the next, fifth-generation, Micro-Exposure Tool (MET-5) at CNSE’s Albany NanoTech Complex.

The MET-5 program is managed by the SEMATECH consortium, whose members and partners include leading semiconductor manufacturing companies worldwide. The program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nm. This supports EUV resist and EUV mask developments intended to meet the international technology road map for semiconductors and associated decreasing linewidths.

Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo’s Extreme Precision Optics operation in Richmond, Calif.

For more information, visit: www.zygo.com  



Comments
Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2016 Photonics Media
x We deliver – right to your inbox. Subscribe FREE to our newsletters.