WILMINGTON, Mass., Jan. 13, 2012 — With the release of the Sinteron 2010, Xenon Corp. delivers greater flexibility for sintering conductive Cu and Ag metallic inks, curing thin-film substrates, and for solar and surface modifications. Whereas the previous-generation Sinteron 2000 featured four preset values for the pulse widths, the Sinteron 2010 allows for digitally programmable pulse widths. The ability to dial up any desired width makes the new version more flexible and valuable for process development.
A number of features are designed into the 19-in. rack-based stand-alone system. The pulse amplitude can be adjusted, and the pulse width is adjustable from 100 to 2000 μs in increments of 5 µs. Total control of the pulse amplitude and pulse width enables the optical energy delivered by the system to be precisely manipulated.
Because the pulse profile is very linear at maximum amplitude, a relationship of 1000 J/ms can be assumed. The system allows connection for either spiral or linear lamp housings. These can provide optical footprints of 19 × 305 mm or 127-mm diameter areas. The company manufactures lamps and lamp housings, so other optical profiles are readily available.
Applications include photonic sintering of conductive inks for printed electronics in displays, smart cards, radio-frequency identification and solar applications. The noncontact low-thermal characteristics for this process make it suitable for web-based printing techniques such as ink-jet, flexography, gravure and screen print.
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