SANTA ROSA, Calif., Jan. 27, 2013 — Ultraflat dichroic and polychroic thin-film filters that feature flatness of <0.1 wave rms and transmission of >95% have been launched by Alluxa.
They achieve flatness by eliminating the high stresses of as-deposited traditional ion-based coating processes such as ion-beam sputtering and ion-assisted deposition. A proprietary technique uses a plasma hard coating process that produces low-loss, fully dense dielectric films with essentially net zero stress on the primary coated side. The films do not require the lengthy additional coating time of back-side compensation or require the use of thick and expensive substrates.
Typical uses are in imaging and laser-based applications such as confocal microscopy, DNA sequencing and communications.
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