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Ultratech Ships First Sub-20-nm Ambient Control System

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SAN JOSE, Calif., June 20, 2013 — Lithography and laser-processing systems supplier Ultratech Inc. has shipped its first LSA201 ambient control laser spike anneal system to an undisclosed company for the development of FinFET logic technology. The LSA201 system is built on a customizable Unity platform and includes a patented microchamber design that enables precise control over gases that surround wafers during processing. The current instrument is capable of running mixtures of any inert gases, but the microchamber architecture is extendable to more reactive gases for future processes. The device is suitable for...Read full article

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    Published: June 2013
    ambient control systemAmericasBusinessCaliforniaindustrialJeff HebbLSA201microchamberUltratech Inc.Lasers

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