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SUNY’s Nanocollege Selects Ultratech Laser Spike Anneal System

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ALBANY, N.Y., and SAN JOSE, Calif., July 25, 2013 — Ultratech Inc.’s laser spike annealing (LSA) technology has been selected as a primary annealing tool for the Global 450-mm Consortium (G450C), headquartered at SUNY’s College of Nanoscale Science and Engineering (CNSE) in Albany. G450C is a public-private partnership announced by New York Gov. Andrew M. Cuomo in September 2011 to facilitate the transition of wafer size from 300 to 450 mm. It is spearheaded by CNSE in partnership with Intel, IBM, Globalfoundries, Samsung, and TSMC, or Taiwan Semiconductor Manufacturing Co. A new 450-mm cleanroom was developed at CNSE’s...Read full article

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    Published: July 2013
    Glossary
    nano
    An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
    450-mm LSA systemAlbany NanoTech ComplexAmericasAndrew CuomoArthur W. ZafiropouloBusinessCaliforniaCNSEG450CGlobal 450-mm ConsortiumGlobalfoundriesIBMindustrialIntellaser spike annealingLSA technologynanoNew YorkPaul Farrar Jr.SamsungSUNY’s College of Nanoscale Science and EngineeringTaiwan Semiconductor Manufacturing Co.TSMCUltratech Inc.Lasers

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