CARSON CITY, Nev., Sept. 6, 2013 — The Venus series of plasma cleaners from Plasma Etch Inc. is suited for applications in research and development, in university settings and production facilities.
Features include computer control; mass-flow controllers; process data acquisition and archiving; dual sequence programming; hard-copy process recording; and on-screen process trend plotting.
The series offers fully automatic system control and process sequencing capabilities. Proprietary software enables features such as multiple recipe storage, data logging/trending, events/alarms and multistep sequencing.
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