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EV Group Opens Nanoimprint Lithography Center

Photonics.com
Dec 2014
ST. FLORIAN, Austria, Dec. 1, 2014 — EV Group has established the NILPhotonics Competence Center to assist customers with nanoimprint lithography tools for photonics applications.

6-in. nanoimprinted wafer
A 6-in. full-area nanoimprinted wafer processed by nanoimprint lithography solutions. Courtesy of EV Group.


Nanoimprint lithography can improve light extraction and capturing in LEDs and photovoltaic cells, and improve performance in laser diodes, the company said. The company’s full-wafer nanoimprinting technology can pattern 3-D structures in the submicron to nanoscale range, and create features as small as 20 nm.

“Nanoimprint lithography is an enabling technology for the design and manufacture of all kinds of photonic structures, which can significantly shorten time to market and lower cost of production compared to conventional technologies, such as electron-beam writing and stepper systems for optical lithography,” said Markus Wimplinger, corporate technology development and intellectual property director at EV Group.

For more information, visit www.evgroup.com.


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