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eBeam Expands Focus, Education Efforts

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SAN JOSE, Calif., March 10, 2016 — The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, will be expanding its efforts to increase focus on eBeam requirements and new developments. The plans for extreme UV lithography, nanoimprint lithography (NIL) and multibeam mask writing were addressed by industry luminary guest speakers at the annual eBeam Initiative luncheon held during the SPIE Advanced Lithography Conference. Canon Nanotechnologies Inc. has also joined the initiative, providing perspective on...Read full article

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    Published: March 2016
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    nano
    An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
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