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Cymer Gets More Funding for 193nm Research

Photonics.com
Jun 2000
SAN DIEGO, June 23 -- Cymer Inc. has received additional funding from International SEMATECH, an Austin, Texas-based semiconductor research consortium, to extend its study of 193nm lithography applications. The companies have been working together for almost two years to sort out problems associated with the production of lasers for lithography applications.
Tests done by Cymer to determine the long-term optical damage associated with lasers at 193nm have turned up a previously unknown optical damage mechanism. The latest funding is for further research on the actual characterization of optical materials essential to the successful commercialization of this technology.
We are pleased to collaborate with Cymer on this undertaking, said Gerhard Gross, director of lithography at SEMATECH. The combined efforts of Cymer and our organization are designed to improve the infrastructure supporting 193nm optical lithography, which is one of our consortium's highest priority programs.


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