Search
Menu
Lumencor Inc. - ZIVA Light Engine 3-24 LB

New Photoresist Shrinks Features

Facebook X LinkedIn Email
Kathleen G. Tatterson

SAN FRANCISCO -- Integrated circuit manufacturers are taking a very close look at a single-layer photoresist that scientists say will support component design smaller than 0.18 µm, with the promise of 0.13-µm design capability within a year.At the American Chemical Society meeting in San Francisco in April, researchers from Bell Laboratories of Murray Hill, N.J., announced the development of a 193-nm, etch-resistant, aqueous-base photoresist material that they believe will fulfill the next phase of Moore's Law of the semiconductor industry. According to this popular standard, in...Read full article

Related content from Photonics Media



    Articles


    Products


    Photonics Handbook Articles


    White Papers


    Webinars


    Photonics Dictionary Terms


    Media


    Photonics Buyers' Guide Categories


    Companies
    Published: June 1997
    industrialResearch & TechnologyTech Pulse

    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.