SPIE to Launch Journal of Microlithography, Microfabrication and Microsystems
BELLINGHAM, Wash., May 3 -- SPIE, The International Society for Optical Engineering, announced the launch of a new journal, the Journal of Microlithography, Microfabrication and Microsystems (JM3). The premier issue will be published in March 2002.
Burn Jeng Lin of Taiwan Semiconductor Manufacturing Company, Ltd. (TSMC) has been appointed Editor-in-Chief. Lin earned his PhD in electrical engineering from Ohio State University. He has been a research staff manager at IBM T. J. Watson Research Center; a department manager at IBM GTD, Burlington; staff member at IBM ASTC East Fishkill; assignee at SEMATECH; and most recently was president of Linnovation Inc. He is presently Senior Director of the Micro Patterning Division of TMSC.
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