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Lambda Physik AG and Jenoptik AG Form Joint Venture for Nanotechnology Research

Photonics.com
May 2001
GOTTINGEN, May 21 -­ Lambda Physik AG, a company listed on the Neuer Markt, has founded a joint venture with Jenoptik Laser Optik Systeme GmbH for the purpose of developing and producing radiation sources in the extreme ultraviolet range (EUV). The two companies each hold a 50 percent stake in XTREME technologies GmbH.
"The founding of XTREME technologies accords with our goal of offering a four wavelength strategy (248, 193, 157, and 13.5 nm) for microlithography. The shortest wavelength up to which excimer laser technology, of which we are the leading supplier, can be used is 157 nm," said Manfred Rahe, chief technology officer of Lambda Physik. "The semiconductor industry favors EUV as the successor technology. Our goal is to offer customers a complete range of light source products with shorter wavelengths for the production of more efficient microchips. The joint venture will advance development and production of such EUV beam sources."
    With sites in Gottingen and Jena, XTREME technologies GmbH will develop electrically excited discharge plasmas and laser-produced plasma sources. Lambda Physik AG is contributing its expertise in gas discharge and pulsed circuit technologies and in excimer and solid-state laser technologies. Jenoptik Laser Optik Systeme is contributing its expertise in solid-state laser development and in optics. XTREME will also perform the task of marketing the products. When ready for market, the developed products are to be sold via the distribution network of Lambda Physik AG, which will also make its global service network available to meet the after-sale needs of customers.


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