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Storex develops optical lithography technique

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Storex Technologies Inc. has developed an optical lithography technique with a resolution of 1 nm half-pitch lines, clearing a major hurdle in this field.

Many attempts have been made to break the diffraction limit, which Storex researchers said has long been a problem in optical lithography. In its study, the company demonstrated that quantum optical lithography can attain 1-nm resolution by optical means using new materials, including fluorescent photosensitive glass ceramics and QMC-5, a proprietary photoresist material.

As part of the study, nanostructures were analyzed by transmission electron microscopy (TEM) and scanning electron microscope (SEM), and a dependence between laser power and line width was established. Written patterns on the QMC-5 were then transferred onto a silicon wafer using an etching process.

The performance is several times better than that described for any other optical or electron beam lithography methods, said Storex CEO Eugen Pavel.

Previous attempts in similar studies had only demonstrated direct beam writing of 2-nm-width lines.

The work was published in Optics & Laser Technology. (doi: 10.1016/j.optlastec.2014.01.016)

For more information, visit: www.storextechnologies.com
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Glossary
diffraction
As a wavefront of light passes by an opaque edge or through an opening, secondary weaker wavefronts are generated, apparently originating at that edge. These secondary wavefronts will interfere with the primary wavefront as well as with each other to form various diffraction patterns.
etching
The engraving of a surface by acid, acid fumes or a tool; a process extensively used in the manufacture of reticles.
photoresist
Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a crucial component in the patterning of semiconductor wafers during the manufacturing process. The primary function of photoresist is to undergo a chemical or physical change when exposed to light, making it selectively soluble or insoluble in a subsequent development step. The general...
scanning electron microscope
An electron microscope that uses a beam of electrons -- accelerated to high energy and focused on the sample -- to scan the sample surface, ejecting secondary electrons that form the picture of the sample.
transmission electron microscope
A type of microscope that uses magnetic lenses to transmit a beam of electrons through an object; the electrons are then focused on a fluorescent screen to form an enlarged image.
AmericasBusinessCoatingsDelawarediffractionetchingEuropelight speedMicroscopyOpticsphotoresistResearch & TechnologyRomaniascanning electron microscopeSEMsilicon waferspectroscopyTEMtransmission electron microscopeWafersStorex Technologiesquantum optical lithographyQMC-5Eugen PavelLasers

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