TSV Development Partnership
CEA-Leti and SPP Process Technology
Systems of Grenoble, France, and Tokyo, respectively, have announced their partnership
to develop 300-mm through-silicon via (TSV) 3-D integrated circuit processes at
CEA-Leti’s company’s facilities in France. The partners will research
alternative hardware and processes to address the need for new, cost-effective methods
for via fill. In addition, the agreement defines their collaboration on a range
of 3-D TSV processes that optimize the etch and deposition technologies used to
create high-aspect-ratio TSVs.
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