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PI Physik Instrumente - Semiconductor Applications 5/24 ROS LB
Photonics Dictionary

thin-film deposition equipment

Thin-film deposition equipment refers to machinery and tools used in the process of depositing thin layers of material onto a substrate surface. This technique is commonly employed in various industries such as semiconductor manufacturing, optics, photovoltaics, and electronics.

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The process involves depositing layers of material, often just a few nanometers to micrometers thick, onto a substrate in a controlled manner. This can be achieved through various methods including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and sputtering.

Thin-film deposition equipment typically consists of vacuum chambers, sources of material to be deposited (such as evaporators or sputtering targets), substrate holders or stages, and control systems. These systems are engineered to create and maintain the required vacuum conditions, control the deposition process parameters such as temperature, pressure, and deposition rate, and ensure uniformity and quality of the deposited thin films.

The equipment may vary in size and complexity depending on the specific application and requirements of the thin-film deposition process, ranging from laboratory-scale systems for research and development to large-scale industrial systems for mass production.
 
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