SPIE Medical Imaging

SPIE invites papers for its 41st Advanced Lithography 2016 conference. The event is structured into seven parts; Alternative Lithographic Technologies; Extreme Ultraviolet Lithography, Metrology, Inspection and Process Control for Microlithography; Advances in Patterning Materials and Processing Technology; Optical Microlithography; Design-Process-Technology Co-Optimization for Manufacturability; and Advanced Etch Technology for Nanopatterning. The symposium probes current issues of the lithography field through a series of panel discussions and seminars.