Photonics Dictionary

Chemical vapor deposition (CVD) equipment refers to a class of specialized apparatus used in the process of chemical vapor deposition, a technique for depositing thin films of various materials onto...

Plasma-enriched deposition or planar magnetic sputtering that offers increased deposition rates in optical thin-film production. This technology surpasses conventional and RF sputtering.

A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the...

The use of a plasma to induce the formation of oxides in the production of graded-index optical fibers.

Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface...

A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds...