Process Vacuum Monitor
Hiden Analytical Ltd.Request Info
Hiden Analytical Ltd.’s HALO 201 MBE (molecular beam epitaxy) in-process vacuum monitor is designed for thin-film preparation and etching.
Mounting on a standard DN-40-CF Conflat-type flange, the probe’s sensitive ionization region is totally shrouded to inhibit random surface deposition. Construction materials are restricted to stainless steel, molybdenum and alumina to minimize potential process contamination in aggressive environments.
The unit has a mass range of 1 to 200 atomic mass units for measurement of all common gases and contaminants, with operating modes for vacuum species identification, leak detection and process trend analysis. User-assignable input/outputs enable simultaneous operation for identification of process irregularities and for vacuum protection.
MASsoft Professional PC control software is intuitive and multilevel, offering simple operation. Features include template-driven quick-start operation, multiple residual gas analysis operation over Ethernet link, mixed-mode scanning, trend analysis extraction from multiple sequential mass range scans and auto mass alignment. The PC interface includes TCP/IP, USB and RS-232 communication links, multiprotocol RS-485 links for external devices such as temperature and process pressure, and five-channel transistor-transistor logic for process control auto start/stop triggering.
https://www.hidenanalytical.com
/Buyers_Guide/Hiden_Analytical_Ltd/c6068
Published: November 2012
REQUEST INFO ABOUT THIS PRODUCT
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:
Message:
When you click "Send Request", we will record and send your personal contact information to Hiden Analytical Ltd. by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our
Privacy Policy and
Terms and Conditions of Use.
Register or login to auto-populate this form:
Login
Register
* Required