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EDGE AND ANGLE OPTICAL POLISHING

Photonics Spectra
Oct 2001
Valley Design Corp., HeadquartersRequest Info
 
Many optoelectronic manufacturers of devices such as waveguides, edge mirrors, VOA, AWG, dynamic gain equalizers and beamsplitters are beginning to acknowledge that end-face polishing can optimize these devices' optical performance. Using Valley Design's new technology, which produces an optical-quality edge surface finish, improved optical performance can now be realized. Valley Design provides edge and angle polishing of various substrate materials including fused silica, silicon, silicon/oxide hybrids, sapphire, Pyrex, phosphate glass, LiN, and LiTaO3.

Typical optical specifications are: edge chips < 1 micron; surface finish < 10/5 scratch/dig (< 10 angstroms); 8-degree angles; No visible scratching under 50X magnification; no visible defects in silica layer under 500X magnification; edge plane orientation +/- .1 degree; oxide rolloff < 1000 angstroms; flatness < 3.5 microns per 10 mm.


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