Request InfoCymer Inc.A krypton fluoride production light source for use in semiconductor manufacturing has been unveiled by Cymer Inc. The ELS-7000 is designed for next-generation lithography applications at 248 nm and provides a repetition rate of 4 kHz and output power of 30 W. The light source also offers variable energy and repetition rate operation for increased process latitude; the MicroInject, for minimized operational downtime; and high-accuracy tuning technology for wavelength stability. The ELS-7000 is suitable for use with 200- and 300-mm lithography scanners whose lenses have numerical apertures of...See full productRelated content from Photonics MediaPRODUCTSVision-Spectra.com January 2024 IssueSWIR Megapixel CamerasThe Sens 1280 CxP and SDI from New Imaging Technologies are megapixel SWIR cameras created for industrial machine vision, semiconductor inspection, solar cell inspection, and wide-area surveillance...Photonics.com 11/21/2022Multigrip Bending AttachmentThe multigrip attachment for the BendMaster robotic arm from TRUMPF SE & Co. KG delivers greater productivity for automated bending processes. 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