THIN-FILM METROLOGY
Scientific Computing InternationalRequest Info
The FilmTek 2000M-DUV thin-film metrology tool from Scientific Computing International is suitable for research and development and for volume production of 90-nm semiconductor devices. It can monitor wafers for 193-nm deep-UV lithography and can measure thickness and optical film properties simultaneously. Based on broadband spectrophotometry at wavelengths of 190 to 1700 nm, the system provides a measurement spot size as small as 5 µm in diameter. A proprietary algorithm enables full characterization of single- and multiple-layer films with thicknesses from 3 Å to 250 µm for deposition, diffusion, etching and lithography processes.
https://www.sci-soft.com
/Buyers_Guide/Scientific_Computing_International/c13246
Published: December 2002
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