DEEP-UV LIGHT SOURCE
Cymer Inc.Request Info
The XLA 105 argon-fluoride excimer light source manufactured by Cymer Inc. is designed to support 65-nm photolithography applications. Based on proprietary master oscillator power amplifier dual-gas-discharge-chamber technology, it is intended for volume production of semiconductor devices. It operates at a 4-kHz repetition rate and delivers 40 W of output to provide full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral. Pulse duration is ≥=70 ns, reducing peak fluence and increasing the lifetime of the scanner optics.
http://www.cymer.com
/Buyers_Guide/Cymer_Inc/c3327
Published: May 2004
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