With the Helios sputter coating system from Leybold Optics GmbH, substrates with dimensions ranging from microns to 100 mm in diameter can be loaded. Based on reactive magnetron sputtering, the system can be equipped with the OMS 4000 intermittent-mode, on-substrate optical growth monitor. The company says that the layer performance of the system is dense, temperature-shift-free and amorphous, and that it exhibits high deposition rates, refractive index, level of reproducibility and yield. An optional automated cassette substrate handling system is compatible with semiconductor standards. Alternative system configurations include a single-substrate load lock and application-specific sputter sources.