Request InfoIbsen Photonics A/SIbsen Photonics A/S has announced 2-D phase masks for single-exposure production of square lattice grating structures. Featuring ±0.01-nm period accuracy, the masks allow one-step exposure of 2-D grating structures over large grating areas. They can be used with laser illumination or in a volume-production-oriented near-field holography mask aligner process. The masks are usable for grating periods from 200 to 687 nm and are optimized to operate under wavelengths from 193 to 435 nm. 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