May 2005Carl Zeiss Microscopy LLCRequest Info
A 200-kV field-emission ultrahigh-resolution transmission electron microscope manufactured by Carl Zeiss SMT Inc. has achieved 0.8-Å (0.08 nm) image resolution. Developed with CEOS GmbH, the microscope uses electron optical components for aberration correction, electron beam monochromatization and energy-filtered imaging. The instrument is designed for subangstrom characterization of atomic scale analysis of transistor gate areas and for nanotechnology research and development. Other applications include process development and control of integrated circuit devices.