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THIN-FILM MAPPING

Photonics Spectra
Jun 1998
Filmetrics Inc.Request Info
 
tMAP The F50 thin-film thickness mapping system from Filmetrics Inc. is designed for semiconductor wafer characterization and optical coating. It automatically measures the thickness of oxides, nitrides, resists, polymers and other films used in silicon, III-V and LCD fabrication. Films between 20 nm and 30 µm thick can be measured on substrates up to 8 in. in diameter. The system also models and characterizes complex multilayer optoelectronic structures such as vertical-cavity lasers and distributed Bragg reflectors.


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