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THIN-FILM DEPOSITION

Photonics Spectra
Jan 2007
Morgan Technical CeramicsRequest Info
 
Morgan-Advanced-Ceramics.gifThe Diamonex Products Div. of Morgan Advanced Ceramics is offering a stand-alone, fully automated thin-film chemical vapor deposition system for research, prototyping and entry-level production applications. It provides various combinations of substrate etching, cleaning and deposition of metal, oxide, nitride, dielectric layers or diamondlike carbon, including multiple layers. Used for processing or coating wafers and samples up to 200 mm in diameter, the device features the closed-drift CD Source for etching, ion-assisted or direct ion beam deposition; a magnetron source for RF or DC sputtering; an RF substrate stage for plasma-enhanced capability; and Windows-based control software.


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