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MICROLITHOGRAPHY STAGE

Photonics Spectra
Jan 2007
Schneider Electric Motion USARequest Info
 
The SF-100 rotational substrate stage from Intelligent Micro Patterning LLC enables precise maskless patterning on cylindrical surfaces. An add-on to the company’s maskless micropatterning system, the stage provides highly controllable and repeatable patterning of cylindrical substrates using standard photolithographical materials and techniques. Pattern features as small as 10 μm are possible with the device, which also offers low backlash, high-output torque, Windows-based operating software, and easily and quickly modifiable mounting positions.


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