Request InfoVistec Electron Beam GmbHVistec Electron Beam GmbH has launched the SB250 electron beam lithography system for direct and midrange mask writing applications. The system operates in the standard writing modes of variable shaped beam, write-on-the-fly principle and vector scan, and in two optional modes, flexible stage speed and multipass. With automatic substrate handling and a 210 × 210-mm2 stage travel range, the system takes masks up to 7 in. and wafers up to 200 mm. 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