Apr 2009Advanced Micro Patterning LLCRequest Info
The SF-100 Xpress maskless exposure system from Intelligent Micro Patterning LLC is closely related to the company’s SF-100 Xtreme maskless lithography system. Built on the same platform, it offers fewer standard features, enabling users to configure the system to meet specific requirements. A six-position filter wheel allows users to choose wavelength spectra, and a fully automated X-Y-Z stage provides one-button operation and autostitching for large substrates. The system, which features an integrated CCD camera for in-line substrate viewing, can be fully field-upgraded to the SF-100 Xtreme.