MO Exposure Optics
Jun 2009SUSS MicroTec AGRequest Info
Illumination system for mask alignersGARCHING, Germany, June 16, 2009 – Suss MicroTec Lithography GmbH has launched an illumination system with patent-pending high-resolution MO exposure optics designed for all generations of the company’s manual and automatic mask aligners. The new optical system is based on microlens arrays of high optical quality to provide higher intensity, improved exposure light uniformity and customized illumination shaping. This allows users of proprietary mask aligners to optimize the process window and enhance yield in contact and proximity lithography.
The MO Exposure Optics are provided with a library of illumination settings, including all of the company’s established mask aligner settings (A-Optics, D-Optics, LGO and HR) plus additional settings like ring illumination, dipole, quadrupole, multipole and maltese cross. By a simple change of the illumination filter plates (IFPs) the user can choose the optimized illumination settings to achieve a higher process latitude.
An automated IFP exchanger is offered for production mask aligners. A free choice of optimized illumination settings, e.g. ring illumination for vias and maltese cross for vertical and horizontal lines, increases the depth of focus and exposure latitude while reducing mask error factors. The system also allows users to design fully made-to-order illumination that optimizes their layer-specific process windows.
Existing mask aligners can be retrofitted in the field with the illumination system.
For more information, visit: www.suss.com
Suss MicroTec Lithography GmbH
Schleissheimer Strasse 90
Phone: +49 89 32007 281
Fax: +49 89 32007 245